- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/86 - Inspecting by charged particle beam [CPB]
Patent holdings for IPC class G03F 1/86
Total number of patents in this class: 77
10-year publication summary
4
|
3
|
5
|
5
|
8
|
13
|
4
|
10
|
12
|
0
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 6816 |
13 |
Carl Zeiss SMT GmbH | 2646 |
12 |
KLA-Tencor Corporation | 2574 |
8 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
6 |
Samsung Electronics Co., Ltd. | 131630 |
5 |
Applied Materials Israel, Ltd. | 549 |
3 |
Lam Research Corporation | 4775 |
3 |
NuFlare Technology, Inc. | 770 |
3 |
KLA Corporation | 1223 |
3 |
Hitachi High-Technologies Corporation | 2034 |
2 |
FUJIFILM Corporation | 27102 |
2 |
SK Hynix Inc. | 11030 |
2 |
Hoya Corporation | 2822 |
2 |
Hitachi High-Tech Corporation | 4424 |
2 |
Nikon Corporation | 7162 |
1 |
Advantest Corporation | 1939 |
1 |
Carl Zeiss SMS GmbH | 56 |
1 |
Carl Zeiss SMS Ltd. | 44 |
1 |
Dongfang Jingyuan Electron Limited | 36 |
1 |
Exogenesis Corporation | 77 |
1 |
Other owners | 5 |